Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials

• Jun Zhao,
• Bettina Frank,
• Frank Neubrech,
• Chunjie Zhang,
• Paul V. Braun and
• Harald Giessen

Beilstein J. Nanotechnol. 2014, 5, 577–586, doi:10.3762/bjnano.5.68

• MSEB, MC-246, 1304 W. Green Street, Urbana, Illinois 61801, United States 10.3762/bjnano.5.68 Abstract Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex

• Beilstein TV. Keywords: hole-mask colloidal nanolithography; localized surface plasmon resonance sensing; low-cost large-area plasmonic nanostructures; multilayer fabrication; surface-enhanced infrared absorption spectroscopy (SERS); Introduction Optics with metallic nanostructures has generated keen

• ]. Here, we present an overview over hole-mask colloidal nanolithography [22], which we combine with tilted angle rotation evaporation [23]. Our method is inherently large-area, low-cost (as it can be added simply to standard thermal or electron-gun evaporators), flexible (as programming of stepper motors